Top-down nanofabrication and characterization of 20 nm silicon nanowires for biosensing applications

Top-down nanofabrication and characterization of 20 nm silicon nanowires for biosensing applications

A top-down nanofabrication approach is used to develop silicon nanowires from silicon-oninsulator (SOI) wafers and involves direct-write electron beam lithography (EBL), inductively coupled plasma-reactive ion etching (ICP-RIE) and a size reduction process. To achieve nanometer scale size, the cruci...

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Bibliographic Details
Main Authors: Md Nor, Mohammad Nuzaihan, Hashim, Uda, Md Arshad, Mohd Khairuddin, A. Rahim, Ruslinda, Rahman, S. F. A., Mohamad Fathil, Mohamad Faris, Ismail, Mohd. H.
Format: Article
Language:English
Published: Public Library of Science 2016
Online Access:http://psasir.upm.edu.my/id/eprint/56158/1/56158.PDF

Internet

http://psasir.upm.edu.my/id/eprint/56158/1/56158.PDF

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