Top-down nanofabrication and characterization of 20 nm silicon nanowires for biosensing applications
A top-down nanofabrication approach is used to develop silicon nanowires from silicon-oninsulator (SOI) wafers and involves direct-write electron beam lithography (EBL), inductively coupled plasma-reactive ion etching (ICP-RIE) and a size reduction process. To achieve nanometer scale size, the cruci...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
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Public Library of Science
2016
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| Online Access: | http://psasir.upm.edu.my/id/eprint/56158/1/56158.PDF |
| _version_ | 1825931360815022080 |
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| author | Md Nor, Mohammad Nuzaihan Hashim, Uda Md Arshad, Mohd Khairuddin A. Rahim, Ruslinda Rahman, S. F. A. Mohamad Fathil, Mohamad Faris Ismail, Mohd. H. |
| author_facet | Md Nor, Mohammad Nuzaihan Hashim, Uda Md Arshad, Mohd Khairuddin A. Rahim, Ruslinda Rahman, S. F. A. Mohamad Fathil, Mohamad Faris Ismail, Mohd. H. |
| author_sort | Md Nor, Mohammad Nuzaihan |
| collection | UPM |
| description | A top-down nanofabrication approach is used to develop silicon nanowires from silicon-oninsulator (SOI) wafers and involves direct-write electron beam lithography (EBL), inductively coupled plasma-reactive ion etching (ICP-RIE) and a size reduction process. To achieve nanometer scale size, the crucial factors contributing to the EBL and size reduction processes are highlighted. The resulting silicon nanowires, which are 20 nm in width and 30 nm in height (with a triangular shape) and have a straight structure over the length of 400 μm, are fabricated precisely at the designed location on the device. The device is applied in biomolecule detection based on the changes in drain current (Ids), electrical resistance and conductance of the silicon nanowires upon hybridization to complementary target deoxyribonucleic acid (DNA). In this context, the scaled-down device exhibited superior performances in terms of good specificity and high sensitivity, with a limit of detection (LOD) of 10 fM, enables for efficient label-free, direct and higher-accuracy DNA molecules detection. Thus, this silicon nanowire can be used as an improved transducer and serves as novel biosensor for future biomedical diagnostic applications. |
| first_indexed | 2024-03-06T09:25:34Z |
| format | Article |
| id | upm.eprints-56158 |
| institution | Universiti Putra Malaysia |
| language | English |
| last_indexed | 2024-03-06T09:25:34Z |
| publishDate | 2016 |
| publisher | Public Library of Science |
| record_format | dspace |
| spelling | upm.eprints-561582017-07-03T09:40:10Z http://psasir.upm.edu.my/id/eprint/56158/ Top-down nanofabrication and characterization of 20 nm silicon nanowires for biosensing applications Md Nor, Mohammad Nuzaihan Hashim, Uda Md Arshad, Mohd Khairuddin A. Rahim, Ruslinda Rahman, S. F. A. Mohamad Fathil, Mohamad Faris Ismail, Mohd. H. A top-down nanofabrication approach is used to develop silicon nanowires from silicon-oninsulator (SOI) wafers and involves direct-write electron beam lithography (EBL), inductively coupled plasma-reactive ion etching (ICP-RIE) and a size reduction process. To achieve nanometer scale size, the crucial factors contributing to the EBL and size reduction processes are highlighted. The resulting silicon nanowires, which are 20 nm in width and 30 nm in height (with a triangular shape) and have a straight structure over the length of 400 μm, are fabricated precisely at the designed location on the device. The device is applied in biomolecule detection based on the changes in drain current (Ids), electrical resistance and conductance of the silicon nanowires upon hybridization to complementary target deoxyribonucleic acid (DNA). In this context, the scaled-down device exhibited superior performances in terms of good specificity and high sensitivity, with a limit of detection (LOD) of 10 fM, enables for efficient label-free, direct and higher-accuracy DNA molecules detection. Thus, this silicon nanowire can be used as an improved transducer and serves as novel biosensor for future biomedical diagnostic applications. Public Library of Science 2016 Article PeerReviewed application/pdf en http://psasir.upm.edu.my/id/eprint/56158/1/56158.PDF Md Nor, Mohammad Nuzaihan and Hashim, Uda and Md Arshad, Mohd Khairuddin and A. Rahim, Ruslinda and Rahman, S. F. A. and Mohamad Fathil, Mohamad Faris and Ismail, Mohd. H. (2016) Top-down nanofabrication and characterization of 20 nm silicon nanowires for biosensing applications. PLOS ONE, 11 (3). art. no. e0152318. pp. 1-21. ISSN 1932-6203 10.1371/journal.pone.0152318 |
| spellingShingle | Md Nor, Mohammad Nuzaihan Hashim, Uda Md Arshad, Mohd Khairuddin A. Rahim, Ruslinda Rahman, S. F. A. Mohamad Fathil, Mohamad Faris Ismail, Mohd. H. Top-down nanofabrication and characterization of 20 nm silicon nanowires for biosensing applications |
| title | Top-down nanofabrication and characterization of 20 nm silicon nanowires for biosensing applications |
| title_full | Top-down nanofabrication and characterization of 20 nm silicon nanowires for biosensing applications |
| title_fullStr | Top-down nanofabrication and characterization of 20 nm silicon nanowires for biosensing applications |
| title_full_unstemmed | Top-down nanofabrication and characterization of 20 nm silicon nanowires for biosensing applications |
| title_short | Top-down nanofabrication and characterization of 20 nm silicon nanowires for biosensing applications |
| title_sort | top down nanofabrication and characterization of 20 nm silicon nanowires for biosensing applications |
| url | http://psasir.upm.edu.my/id/eprint/56158/1/56158.PDF |
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