Top-down nanofabrication and characterization of 20 nm silicon nanowires for biosensing applications
A top-down nanofabrication approach is used to develop silicon nanowires from silicon-oninsulator (SOI) wafers and involves direct-write electron beam lithography (EBL), inductively coupled plasma-reactive ion etching (ICP-RIE) and a size reduction process. To achieve nanometer scale size, the cruci...
| Main Authors: | , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Public Library of Science
2016
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| Online Access: | http://psasir.upm.edu.my/id/eprint/56158/1/56158.PDF |