Development Of Si02 Thin Film On singlecrystal Sic By anodic oxidation technique.
Anodic silicon dioxide (Si02) thin film is growth on p- and n-type silicon (Si) and p-type 4H-silicon carbide (SiC) substrate with the thickness ranging from 50-130 nm. Filem nipis Si02 tersadur anod telah ditumbuhkankan di atas substrat silikon (Si) jenis p dan n serta silikon karbida jenis-p de...
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| Format: | Monograph |
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Universiti Sains Malaysia
2008
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