Investigation of low dielectric constant (k) films for deep sub-micron CMOS application.
Silica (Si02) thin film on Si with low dielectric constant (k) properties has been systematically prepared and investigated. Two types of this low-k material have been deposited on Si via sol-gel spin-on coating. Filem nipis silika (Si02) yang berpemalar dieletrik rendah endap di atas Si tlah dis...
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| Format: | Monograph |
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Universiti Sains Malaysia
2007
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