Physical Characteristics Of Sol-gel Derived SiO2 Thick Film on 4H-SiC.
The excellent properties of SiC have led to the usage of this material as a substrate for high power, high temperature, and high frequency metal-oxide-semiconductor (MOS)-based device applications [1,2,3].
Main Authors: | , , |
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Format: | Conference or Workshop Item |
Language: | English |
Published: |
2007
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Subjects: | |
Online Access: | http://eprints.usm.my/13614/1/Physical_characteristics.pdf |