Structural and optical properties of ZnO thin films deposited using atomic layer deposition technique
ZnO films have been successfully deposited by Atomic Layer Deposition (ALD) using Diethylzinc (DEZn) and water (H2O) as precursors.
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| Format: | Conference or Workshop Item |
| Language: | English |
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2011
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| Online Access: | http://eprints.usm.my/25179/1/STRUCTURAL_AND_OPTICAL_PROPERTIES_OF_ZnO_THIN_FILMS_DEPOSITED_USING_ATOMIC_LAYER_DEPOSITION_TECHNIQUE.pdf |