Effects of Substrate Temperature on the Properties of Indium Nitride Thin Films Grown on Flexible Prepared by Reactive Sputtering Method
In this study, indium nitride (InN) thin films were deposited on kapton polymide flexible substrate by reactive radio frequency (RF) sputtering method using indium target in a mixture of Ar and N2 gases. The InN thin films were deposited under different substrate temperatures, i.e., 1 00°C and 20...
| Main Authors: | , , , |
|---|---|
| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
2015
|
| Subjects: | |
| Online Access: | http://eprints.usm.my/48735/1/Section%20C%20157-2.pdf%20cut.pdf |
| Summary: | In this study, indium nitride (InN) thin films were deposited on kapton polymide flexible
substrate by reactive radio frequency (RF) sputtering method using indium target in a mixture of Ar
and N2 gases. The InN thin films were deposited under different substrate temperatures, i.e., 1 00°C
and 200°C. The effects of substrate temperature on structural, surface morphologies and optical
properties of InN thin films were systematically investigated by using X-ray diffraction technique, field
emission scanning electron microscope, energy dispersive X-ray spectroscopy, and Fourier transform
infrared spectroscopy. |
|---|