Influence of substrate annealing on inducing Ti3+ and oxygen vacancy in TiO2 thin films deposited via RF magnetron sputtering

Influence of substrate annealing on inducing Ti3+ and oxygen vacancy in TiO2 thin films deposited via RF magnetron sputtering

Nano-crystalline TiO2 has been prepared by RF magnetron sputtering at varied substrate temperatures ranging from 200 to 500 °C. The alteration of oxygen and titanium atom in TiO2 at uppermost surface is clearly observed on the effect of annealing temperature by Auger Electron Spectroscopy (AES) tech...

Full description

Bibliographic Details
Main Authors: Abdullah, S.A., Sahdan, M.Z., Nafarizal, N., Saim, H., Embong, Z., Cik Rohaida, C.H., Adriyanto, F.
Format: Article
Language:English
Published: ScienceDirect 2018
Subjects:
TA401-492 Materials of engineering and construction. Mechanics of materials
Online Access:http://eprints.uthm.edu.my/3360/1/AJ%202018%20%284%29.pdf

Internet

http://eprints.uthm.edu.my/3360/1/AJ%202018%20%284%29.pdf

Similar Items