Effect of etching as pre-treatment for electroless copper plating on silicon wafer
Metallic coatings, such as copper films can be easily deposited on semiconductor materials like silicon wafer without prior surface pre-treatment using the electroless process. However, the adhesion of the copper film can be very weak and can easily peels off. In this study, the effect of etching in...
| Main Authors: | , , , , |
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| Format: | Article |
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Penerbit UTM Press
2017
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