Morphological studies of silicon carbide thin film deposited by very high frequency - plasma enhanced chemical vapour deposition through gas dilution adjustment
Dilution of gas was deployed to investigate the surface morphology and the surface topography of Silicon Carbide (SiC) film deposited using Very High Frequency – Plasma Enhanced Chemical Vapour Deposition (VHF-PECVD) technique. The deposition process of SiC thin film was performed with 150 MHz excit...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Malaysian Society of Analytical Sciences
2022
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| Subjects: | |
| Online Access: | http://eprints.utm.my/102768/1/MuhammadFirdausOmar2022_MorphologicalStudiesofSiliconCarbideThin.pdf |