Investigation of carbon thin films by pulsed laser deposition at different temperatures
Effect of temperature on the deposition of Carbon thin Film is reported in this paper. KrF Excimer laser (248 nm, 13-50 mJ and 20 ns) is focused at an angle of 45° on pure graphite target. Silicon (111) wafer, as a substrate is placed at distance of 15 mm from the target surface. The carbon thin fil...
| Main Authors: | , , , , |
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| Format: | Article |
| Published: |
2010
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| Subjects: |