Graphite thin film deposition using laser induced plasma
The Excimer KrF laser (of wave length 248 nm, pulse energy of 13-50 mJ and pulse width of 20 ns) has been used to ablate graphite solid target. Thin films of graphite material have been grown on silicon (Si) substrate at different temperatures (25°C & 300°C). The techniques x-ray diffraction (XR...
| Main Authors: | , , , , , |
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| Format: | Article |
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Elsevier B.V.
2011
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