Morphological and optical characteristics of porous silicon structure formed by electrochemical etching

Morphological and optical characteristics of porous silicon structure formed by electrochemical etching

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Porous silicon (PS) structures are prepared by electrochemical etching method using HF and ethanol as a electrolyte solution. The surface and cross-sectional morphology and optical characteristics of the formed PS structures as a dependence of the anodization time are studied. Although the anodizati...

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Bibliographic Details
Main Authors: Astuti, B., Rusli, N. I., Hashim, Abdul Manaf, Othaman, Z., Nafarizal, N., Al Obaidi, Nihad K. Ali, Mat Safri, Norlaili
Format: Book Section
Published: American Institute of Physics 2011
Subjects:
TK Electrical engineering. Electronics Nuclear engineering
Description
Summary:Porous silicon (PS) structures are prepared by electrochemical etching method using HF and ethanol as a electrolyte solution. The surface and cross-sectional morphology and optical characteristics of the formed PS structures as a dependence of the anodization time are studied. Although the anodization time is changed from 1 minute to 5 minutes in a sequence of 1 minute, the chemical reaction in the prepared solution is fast enough to create pores with remarkable changes in diameter and depth. It suggests that the anodization time of 5 minutes may produce PS structures with smaller grain size compared to the other samples and supports a blue shift of emission peak. The occurrence of blue shift may due to the quantum confinement effect.

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