Fabrication of ZnO nanowire device using top-down approach
ZnO nanowire devices were fabricated from top-down using optical lithography. The nanowires are formed from anisotropic etch of 100 nm Filtered Cathodic Vacuum Arc (FCVA) deposited ZnO thin film. The nanowires are characterized using SEM and Raman spectroscopy via image mapping. The current-voltage...
| Main Authors: | , , , , , |
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| Format: | Book Section |
| Published: |
IEEE Explorer
2011
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| Subjects: |