Two dimensional analytical threshold voltage model of nanoscale strained Si/Si1-xGex MOSFETs including quantum mechanical effects
A new analytical model derived from the Poisson equation for surface potential and threshold voltage (V th), including the Quantum Mechanical Effects (QMEs) is presented for nanoscale strained Si1–x Ge x MOSFETs. Boundary condition approaches are applied in the model. The threshold voltage analytica...
Main Authors: | Siew, Kang Eng, Heong, Yau Wei, Anwar, Sohail, Razali, Ismail |
---|---|
Format: | Article |
Published: |
Amer Scientific Publishers
2012
|
Subjects: |
Similar Items
-
Analytical threshold voltage model of nanoscale biaxial ultrathin strained-Si MOSFETs
by: Heong, Yau Wei, et al.
Published: (2009) -
Materials and electrical characterization of Er(Si1-xGex)(2-y) films formed on Si1-xGex(001) (x=0-0.3) via rapid thermal annealing
by: Setiawan, Y., et al.
Published: (2012) -
Textured Ni(Pt) germanosilicide formation on a condensed Si1-xGex/Si substrate
by: Setiawan, Y., et al.
Published: (2012) -
Analytical threshold voltage model of nanoscale biaxial ultrathin strained-Si MOSFETs /
by: Yau, Wei Heong, author, et al.
Published: (2009) -
Effects of Ti/Co and Co/Ti systems on the germanosilicidation of poly-Si capped poly-Si1−xGex substrate
by: Li, Y. S., et al.
Published: (2013)