XRD studies on residual stress of the diamond films grown using hot filament chemical vapour deposition technique on silicon nitride and tungsten carbide substrates
This study analyses residual stress measurement using X-Ray diffraction method on ultrafine-polycrystalline diamonds and polycrystalline diamonds films grown using Hot Filament Chemical Vapour Deposition technique (HFCVD) on silicon nitride(Si3N4) and tungsten carbide (WC) substrates in the same cha...
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| Format: | Conference or Workshop Item |
| Published: |
2013
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| Subjects: |