The role of silane gas flow rate on PECVD-assisted fabrication of silicon nanowires
Silicon (Si) core–shell nanowires (NWs) were successfully prepared by very high frequency plasma-enhanced chemical vapor deposition technique, and the effect of silane (SiH4) gas flow rates on physicochemical properties of silicon NWs was investigated. Field emission scanning electron microscopy (FE...
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Springer Verlag
2016
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