Fabrication and characterisation of resistive nanocrystalline graphite
This work demonstrates the feasibility of fabricating resistive nanocrystalline graphite (NCG) on a Si substrate. The NCG film thickness of 9 nm was deposited using metal-free plasma enhanced chemical vapour deposition (PECVD) on a 6-inch p-type silicon wafer. The surface and electrical properties o...
| Main Authors: | , , , , , |
|---|---|
| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
2021
|
| Subjects: | |
| Online Access: | http://eprints.utm.my/95958/1/SMSultan2021_FabricationandCharacterisation.pdf |