Controlled defect on multilayer graphene surface by oxygen plasma
The study pertaining defect fabrication of graphene has gained interest nowadays. To date, the fabrication of the defect using reactive ion etching on the oxygen flow rate has not been adequately studied. In this work, fabrication defect on multilayer graphene using reactive ion etching at 30 sccm a...
| Main Authors: | , , , |
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| Format: | Conference or Workshop Item |
| Language: | English |
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2017
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| Online Access: | http://eprints.utm.my/97020/1/SuhailaIsaak2017_ControlledDefectOnMultilayerGrapheneSurface.pdf |
| _version_ | 1796866340223451136 |
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| author | Morsin, Marriatyi Isaak, Suhaila Morsin, Marlia Yusof, Yusmeeraz |
| author_facet | Morsin, Marriatyi Isaak, Suhaila Morsin, Marlia Yusof, Yusmeeraz |
| author_sort | Morsin, Marriatyi |
| collection | ePrints |
| description | The study pertaining defect fabrication of graphene has gained interest nowadays. To date, the fabrication of the defect using reactive ion etching on the oxygen flow rate has not been adequately studied. In this work, fabrication defect on multilayer graphene using reactive ion etching at 30 sccm and 50 sccm oxygen flow rates as a controlled parameter. The other parameters such as pressure, exposure time and power are set as well. The resistance of the exposed multilayer graphene devices at 30 sccm and 50 sccm are respectively 38 and 49 times higher than the non-exposed device. The increased oxygen flow rate in the reactive ion etching deteriorates the crystalline quality of the multilayer graphene thus declines its function as a device. It is suggested that only low oxygen flow rate is to be used to fabricate small amount of defect for the controlled defect purposes. |
| first_indexed | 2024-03-05T21:10:40Z |
| format | Conference or Workshop Item |
| id | utm.eprints-97020 |
| institution | Universiti Teknologi Malaysia - ePrints |
| language | English |
| last_indexed | 2024-03-05T21:10:40Z |
| publishDate | 2017 |
| record_format | dspace |
| spelling | utm.eprints-970202022-09-13T07:02:14Z http://eprints.utm.my/97020/ Controlled defect on multilayer graphene surface by oxygen plasma Morsin, Marriatyi Isaak, Suhaila Morsin, Marlia Yusof, Yusmeeraz TK Electrical engineering. Electronics Nuclear engineering The study pertaining defect fabrication of graphene has gained interest nowadays. To date, the fabrication of the defect using reactive ion etching on the oxygen flow rate has not been adequately studied. In this work, fabrication defect on multilayer graphene using reactive ion etching at 30 sccm and 50 sccm oxygen flow rates as a controlled parameter. The other parameters such as pressure, exposure time and power are set as well. The resistance of the exposed multilayer graphene devices at 30 sccm and 50 sccm are respectively 38 and 49 times higher than the non-exposed device. The increased oxygen flow rate in the reactive ion etching deteriorates the crystalline quality of the multilayer graphene thus declines its function as a device. It is suggested that only low oxygen flow rate is to be used to fabricate small amount of defect for the controlled defect purposes. 2017 Conference or Workshop Item PeerReviewed application/pdf en http://eprints.utm.my/97020/1/SuhailaIsaak2017_ControlledDefectOnMultilayerGrapheneSurface.pdf Morsin, Marriatyi and Isaak, Suhaila and Morsin, Marlia and Yusof, Yusmeeraz (2017) Controlled defect on multilayer graphene surface by oxygen plasma. In: 1st International Conference on Engineering, Science and Nanotechnology 2016, ICESNANO 2016, 3 - 5 August 2016, Solo, Indonesia. http://dx.doi.org/10.1063/1.4968370 |
| spellingShingle | TK Electrical engineering. Electronics Nuclear engineering Morsin, Marriatyi Isaak, Suhaila Morsin, Marlia Yusof, Yusmeeraz Controlled defect on multilayer graphene surface by oxygen plasma |
| title | Controlled defect on multilayer graphene surface by oxygen plasma |
| title_full | Controlled defect on multilayer graphene surface by oxygen plasma |
| title_fullStr | Controlled defect on multilayer graphene surface by oxygen plasma |
| title_full_unstemmed | Controlled defect on multilayer graphene surface by oxygen plasma |
| title_short | Controlled defect on multilayer graphene surface by oxygen plasma |
| title_sort | controlled defect on multilayer graphene surface by oxygen plasma |
| topic | TK Electrical engineering. Electronics Nuclear engineering |
| url | http://eprints.utm.my/97020/1/SuhailaIsaak2017_ControlledDefectOnMultilayerGrapheneSurface.pdf |
| work_keys_str_mv | AT morsinmarriatyi controlleddefectonmultilayergraphenesurfacebyoxygenplasma AT isaaksuhaila controlleddefectonmultilayergraphenesurfacebyoxygenplasma AT morsinmarlia controlleddefectonmultilayergraphenesurfacebyoxygenplasma AT yusofyusmeeraz controlleddefectonmultilayergraphenesurfacebyoxygenplasma |