Showing 1 - 4 results of 4 for search 'Jae-Hoon Yoo', čas poizvedbe: 0.02s Refine Results
  1. 1
    Effect of Process Temperature on Density and Electrical Characteristics of Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition

    Effect of Process Temperature on Density and Electrical Characteristics of Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposit... od Hak-Gyeong Kim, Da-Hee Hong, Jae-Hoon Yoo, Hee-Chul Lee

    Izdano 2022-02-01
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  2. 2
    Characteristics of Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Thin Films Prepared by Direct and Remote Plasma Atomic Layer Deposition for Application to Ferroelectric Memory

    Characteristics of Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Thin Films Prepared by Direct and Remote Plasma Atomic Layer Deposition for Application to Ferroelectric Memory od Da Hee Hong, Jae Hoon Yoo, Won Ji Park, So Won Kim, Jong Hwan Kim, Sae Hoon Uhm, Hee Chul Lee

    Izdano 2023-02-01
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  3. 3
    Enhancing Charge Trapping Performance of Hafnia Thin Films Using Sequential Plasma Atomic Layer Deposition

    Enhancing Charge Trapping Performance of Hafnia Thin Films Using Sequential Plasma Atomic Layer Deposition od So-Won Kim, Jae-Hoon Yoo, Won-Ji Park, Chan-Hee Lee, Joung-Ho Lee, Jong-Hwan Kim, Sae-Hoon Uhm, Hee-Chul Lee

    Izdano 2024-10-01
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  4. 4
    Preparation of Remote Plasma Atomic Layer-Deposited HfO<sub>2</sub> Thin Films with High Charge Trapping Densities and Their Application in Nonvolatile Memory Devices

    Preparation of Remote Plasma Atomic Layer-Deposited HfO<sub>2</sub> Thin Films with High Charge Trapping Densities and Their Application in Nonvolatile Memory Devices od Jae-Hoon Yoo, Won-Ji Park, So-Won Kim, Ga-Ram Lee, Jong-Hwan Kim, Joung-Ho Lee, Sae-Hoon Uhm, Hee-Chul Lee

    Izdano 2023-06-01
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