_version_ | 1826417076911210496 |
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author | 392095 Corl, Edwin A. Wimpfheimer, Hans |
author_facet | 392095 Corl, Edwin A. Wimpfheimer, Hans |
author_sort | 392095 Corl, Edwin A. |
collection | OCEAN |
description | PSZJBL |
first_indexed | 2024-03-05T03:40:15Z |
format | |
id | KOHA-OAI-TEST:303602 |
institution | Universiti Teknologi Malaysia - OCEAN |
language | eng |
last_indexed | 2024-03-05T03:40:15Z |
record_format | dspace |
spelling | KOHA-OAI-TEST:3036022020-12-19T17:10:06ZThickness measurement of silicon dioxide layers by ultraviolet-visible interference method / 392095 Corl, Edwin A. Wimpfheimer, Hans engPSZJBLSiliconChemicals |
spellingShingle | Silicon Chemicals 392095 Corl, Edwin A. Wimpfheimer, Hans Thickness measurement of silicon dioxide layers by ultraviolet-visible interference method / |
title | Thickness measurement of silicon dioxide layers by ultraviolet-visible interference method / |
title_full | Thickness measurement of silicon dioxide layers by ultraviolet-visible interference method / |
title_fullStr | Thickness measurement of silicon dioxide layers by ultraviolet-visible interference method / |
title_full_unstemmed | Thickness measurement of silicon dioxide layers by ultraviolet-visible interference method / |
title_short | Thickness measurement of silicon dioxide layers by ultraviolet-visible interference method / |
title_sort | thickness measurement of silicon dioxide layers by ultraviolet visible interference method |
topic | Silicon Chemicals |
work_keys_str_mv | AT 392095corledwina thicknessmeasurementofsilicondioxidelayersbyultravioletvisibleinterferencemethod AT wimpfheimerhans thicknessmeasurementofsilicondioxidelayersbyultravioletvisibleinterferencemethod |