Roles of Atomic Nitrogen/Hydrogen in GaN Film Growth by Chemically Assisted Sputtering with Dual Plasma Sources

Roles of Atomic Nitrogen/Hydrogen in GaN Film Growth by Chemically Assisted Sputtering with Dual Plasma Sources

التفاصيل البيبلوغرافية
المؤلفون الرئيسيون:	Atsushi Tanide, Shohei Nakamura, Akira Horikoshi, Shigeru Takatsuji, Takahiro Kimura, Kazuo Kinose, Soichi Nadahara, Masazumi Nishikawa, Akinori Ebe, Kenji Ishikawa, Osamu Oda, Masaru Hori
التنسيق:	مقال
اللغة:	English
منشور في:	American Chemical Society 2020-10-01
سلاسل:	ACS Omega
الوصول للمادة أونلاين:	https://doi.org/10.1021/acsomega.0c03865

مواد مشابهة

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Author Correction: Epitaxial growth of high-quality GaN with a high growth rate at low temperatures by radical-enhanced metalorganic chemical vapor deposition
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