Systematic Investigation of Gettering Effects on 4th Row Element Impurities in Si by Dopant Atoms

The gettering of 4th row element impurities (K, Ca, 3d transition metals, and Zn) in Si crystals by dopant atoms was systematically investigated by first-principles calculation through evaluation of the diffusion barrier and the binding energy. The dopant atoms considered include p-type dopants (B),...

Бүрэн тодорхойлолт

Номзүйн дэлгэрэнгүй
Үндсэн зохиолчид: Koji Sueoka, Ken Kamimura, Seiji Shiba
Формат: Өгүүллэг
Хэл сонгох:English
Хэвлэсэн: Hindawi Limited 2009-01-01
Цуврал:Advances in Materials Science and Engineering
Онлайн хандалт:http://dx.doi.org/10.1155/2009/309209