The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996.
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| Format: | Thesis |
| Language: | eng |
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Massachusetts Institute of Technology
2009
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| Online Access: | http://hdl.handle.net/1721.1/47650 |
| _version_ | 1826190328869158912 |
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| author | Stefanik, Todd Stanley, 1973- |
| author2 | Michael J. Cima. |
| author_facet | Michael J. Cima. Stefanik, Todd Stanley, 1973- |
| author_sort | Stefanik, Todd Stanley, 1973- |
| collection | MIT |
| description | Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996. |
| first_indexed | 2024-09-23T08:38:36Z |
| format | Thesis |
| id | mit-1721.1/47650 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T08:38:36Z |
| publishDate | 2009 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/476502019-04-09T18:56:27Z The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates Stefanik, Todd Stanley, 1973- Michael J. Cima. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. Materials Science and Engineering. Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996. Includes bibliographical references (leaves 108-110). by Todd S. Stefanik. S.M. 2009-10-01T15:29:22Z 2009-10-01T15:29:22Z 1996 1996 Thesis http://hdl.handle.net/1721.1/47650 41881583 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 110 leaves application/pdf Massachusetts Institute of Technology |
| spellingShingle | Materials Science and Engineering. Stefanik, Todd Stanley, 1973- The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates |
| title | The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates |
| title_full | The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates |
| title_fullStr | The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates |
| title_full_unstemmed | The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates |
| title_short | The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates |
| title_sort | effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates |
| topic | Materials Science and Engineering. |
| url | http://hdl.handle.net/1721.1/47650 |
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