Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging
المؤلفون الرئيسيون: | Castell, M, Simpson, T, Mitchell, I, Perovic, D, Baribeau, J |
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التنسيق: | Journal article |
منشور في: |
1999
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مواد مشابهة
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Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging
حسب: Castell, M, وآخرون
منشور في: (1999) -
Deactivation and diffusion of boron in ion-implanted silicon: dopant mapping through secondary electron imaging
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