Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging

Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging

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Dades bibliogràfiques
Autors principals:	Castell, M, Simpson, T, Mitchell, I, Perovic, D, Baribeau, J
Format:	Journal article
Publicat:	1999

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