Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging

Παρόμοια τεκμήρια

• Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging
  ανά: Castell, M, κ.ά.
  Έκδοση: (1999)
• Deactivation and diffusion of boron in ion-implanted silicon: dopant mapping through secondary electron imaging
  ανά: Castell, M, κ.ά.
  Έκδοση: (1999)
• Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
  ανά: Verena Steckenreiter, κ.ά.
  Έκδοση: (2017-03-01)
• Plasma immersion ion implantation of boron for ribbon silicon solar cells
  ανά: Derbouz K., κ.ά.
  Έκδοση: (2013-09-01)
• The Modeling of the Radiation Enhanced Diffusion of Boron in Silicon
  ανά: Gadiyak, G.V., κ.ά.
  Έκδοση: (1994-06-01)