Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging

Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging

अन्य संस्करण दिखाएं (1)

ग्रंथसूची विवरण
मुख्य लेखकों:	Castell, M, Simpson, T, Mitchell, I, Perovic, D, Baribeau, J
स्वरूप:	Journal article
प्रकाशित:	1999

समान संसाधन

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