Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging

Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging

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Detalhes bibliográficos
Main Authors:	Castell, M, Simpson, T, Mitchell, I, Perovic, D, Baribeau, J
Formato:	Journal article
Publicado em:	1999

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