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REACTION-MECHANISMS FOR THE PH...
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REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)
Xehetasun bibliografikoak
Egile Nagusiak:
Jackman, R
,
Ebert, H
,
Foord, J
Formatua:
Journal article
Argitaratua:
1986
Aleari buruzko argibideak
Deskribapena
Antzeko izenburuak
MARC erregistroa
Deskribapena
Gaia:
Antzeko izenburuak
THE INTERACTION OF WF6 WITH SI(100) - THERMAL AND PHOTON INDUCED REACTIONS
nork: Jackman, R, et al.
Argitaratua: (1988)
ADSORPTION, ETCHING AND PHOTOINDUCED REACTIONS AT THE SI(100)-CCL4 INTERFACE
nork: French, C, et al.
Argitaratua: (1989)
Adsorption, etching and photo-induced reactions at the Si(100)-CCl 4 interface
nork: French, C, et al.
Argitaratua: (1989)
CHEMICAL PRECURSORS FOR GAAS ETCHING WITH LOW-ENERGY ION-BEAMS - CHLORINE ADSORPTION ON GAAS(100)
nork: Jackman, R, et al.
Argitaratua: (1991)
THERMAL AND ION-BEAM-INDUCED ETCHING OF INP WITH CHLORINE
nork: Murrell, A, et al.
Argitaratua: (1989)