Hoppa till innehåll
VuFind
English
Deutsch
Español
Français
Italiano
日本語
Nederlands
Português
Português (Brasil)
中文(简体)
中文(繁體)
Türkçe
עברית
Gaeilge
Cymraeg
Ελληνικά
Català
Euskara
Русский
Čeština
Suomi
Svenska
polski
Dansk
slovenščina
اللغة العربية
বাংলা
Galego
Tiếng Việt
Hrvatski
हिंदी
Հայերէն
Українська
Sámegiella
Монгол
Språk
Alla fält
Titel
Upphovsman
Ämne
Signum
ISBN/ISSN
Tagg
Sök
Avancerad
REACTION-MECHANISMS FOR THE PH...
Hänvisa
Textmeddelande
Skicka per e-post
Skriv ut
Exportera posten
Exportera till: RefWorks
Exportera till: EndNoteWeb
Exportera till: EndNote
Permanent länk
REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)
Bibliografiska uppgifter
Huvudupphovsmän:
Jackman, R
,
Ebert, H
,
Foord, J
Materialtyp:
Journal article
Publicerad:
1986
Beståndsuppgifter
Beskrivning
Liknande verk
Katalogiseringsuppgifter
Liknande verk
THE INTERACTION OF WF6 WITH SI(100) - THERMAL AND PHOTON INDUCED REACTIONS
av: Jackman, R, et al.
Publicerad: (1988)
ADSORPTION, ETCHING AND PHOTOINDUCED REACTIONS AT THE SI(100)-CCL4 INTERFACE
av: French, C, et al.
Publicerad: (1989)
Adsorption, etching and photo-induced reactions at the Si(100)-CCl 4 interface
av: French, C, et al.
Publicerad: (1989)
CHEMICAL PRECURSORS FOR GAAS ETCHING WITH LOW-ENERGY ION-BEAMS - CHLORINE ADSORPTION ON GAAS(100)
av: Jackman, R, et al.
Publicerad: (1991)
THERMAL AND ION-BEAM-INDUCED ETCHING OF INP WITH CHLORINE
av: Murrell, A, et al.
Publicerad: (1989)