ELECTRON-BEAM STIMULATED CHEMICAL VAPOR-DEPOSITION OF PATTERNED TUNGSTEN FILMS ON SI(100)

ELECTRON-BEAM STIMULATED CHEMICAL VAPOR-DEPOSITION OF PATTERNED TUNGSTEN FILMS ON SI(100)

Xehetasun bibliografikoak
Egile Nagusiak:	Jackman, R, Foord, J
Formatua:	Journal article
Argitaratua:	1986

Antzeko izenburuak

THERMAL AND PHOTOCHEMICAL VAPOR-DEPOSITION OF FE FROM FE(CO)5 ON SI(100)
nork: Jackman, R, et al.
Argitaratua: (1989)

CHEMICAL VAPOR-DEPOSITION ON SILICON - INSITU SURFACE STUDIES
nork: Foord, J, et al.
Argitaratua: (1984)

LASER CHEMICAL VAPOR-DEPOSITION OF PATTERNED FE ON SILICA GLASS - OBSERVATION AND ORIGINS OF PERIODIC RIPPLE STRUCTURES
nork: Jackman, R, et al.
Argitaratua: (1986)

Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications
nork: 439284 Schmitz, John E. J.
Argitaratua: (1992)

DIAMOND CHEMICAL-VAPOR-DEPOSITION FROM A CAPACITIVELY COUPLED RADIO-FREQUENCY PLASMA
nork: Jackman, R, et al.
Argitaratua: (1995)

STUDIES OF ADSORPTION AND ELECTRON-INDUCED DISSOCIATION OF FE(CO)5 ON SI(100)
nork: Foord, J, et al.
Argitaratua: (1986)

Surface spectroscopic and molecular beam studies of the reactions of trimethylaluminium on Si(100)
nork: Wee, A, et al.
Argitaratua: (1989)

SURFACE SPECTROSCOPIC AND MOLECULAR-BEAM STUDIES OF THE REACTIONS OF TRIMETHYLALUMINUM ON SI(100)
nork: Wee, A, et al.
Argitaratua: (1989)

CHEMICAL-VAPOR-DEPOSITION OF DIAMOND FROM A NOVEL CAPACITIVELY COUPLED RF PLASMA SOURCE
nork: Jackman, R, et al.
Argitaratua: (1995)

Influence of the environment on the surface conductivity of chemical vapor deposition diamond
nork: Foord, J, et al.
Argitaratua: (2002)

DEVELOPMENT OF CHEMICAL BEAM EPITAXY FOR THE DEPOSITION OF GALLIUM NITRIDE
nork: Kingsley, C, et al.
Argitaratua: (1995)

REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)
nork: Jackman, R, et al.
Argitaratua: (1986)

INTERACTION OF HYDROGEN WITH CHEMICAL-VAPOR-DEPOSITION DIAMOND SURFACES - A THERMAL-DESORPTION STUDY
nork: Chua, L, et al.
Argitaratua: (1994)

THE INTERACTION OF AZOMETHANE WITH SI(100)
nork: Loh, K, et al.
Argitaratua: (1995)

Deposition polycrystalline diamond on silicon nitride and tungsten carbide by using hot filament chemical vapor deposition [electronic resource] /
nork: Chee, Kevin Mun Fai, 1985-
Argitaratua: (2009)

Hydrogen addition for centimeter-sized monolayer tungsten disulfide continuous films by ambient pressure chemical vapor deposition
nork: Sheng, Y, et al.
Argitaratua: (2017)

THE INTERACTION OF WF6 WITH SI(100) - THERMAL AND PHOTON INDUCED REACTIONS
nork: Jackman, R, et al.
Argitaratua: (1988)

ALUMINUM FILM GROWTH BY CHEMICAL VAPOR-DEPOSITION OF AIH3(NME3)2
nork: Wee, A, et al.
Argitaratua: (1990)

Particle characterization for an eight inch wafer tungsten chemical vapor deposition system
nork: Morrison, Troy
Argitaratua: (2005)

CHEMICAL PRECURSORS FOR GAAS ETCHING WITH LOW-ENERGY ION-BEAMS - CHLORINE ADSORPTION ON GAAS(100)
nork: Jackman, R, et al.
Argitaratua: (1991)

THE INTERACTION OF ATOMIC-HYDROGEN WITH ADSORBED ETHYLENE AND ACETYLENE ON SI(100)
nork: Chua, L, et al.
Argitaratua: (1994)

Chemical vapor deposition synthesis of graphene films
nork: Fangzhu Qing, et al.
Argitaratua: (2019-02-01)

Deposition polycrystalline diamond on silicon nitride and tungsten carbide by using hot filament chemical vapor deposition /
nork: Chee, Kevin Mun Fai, 1985-, et al.
Argitaratua: (2009)

Characterization of polyerystalline diamond coated on tungsten carbide deposited by microwave plasma assisted chemical vapor deposition /
nork: Esah Hamzah, author, et al.
Argitaratua: (2007)

SURFACE SPECTROSCOPIC STUDIES OF THE INITIAL-STAGES OF DIAMOND GROWTH ON SI(100)
nork: Jackman, R, et al.
Argitaratua: (1993)

Surface blistering and deuterium retention in chemical vapor deposition tungsten exposed to deuterium plasma
nork: Hao Yin, et al.
Argitaratua: (2023-12-01)

Tungsten Oxide Nanorods Array and Nanobundle Prepared by Using Chemical Vapor Deposition Technique
nork: Wang XP, et al.
Argitaratua: (2007-01-01)

Chemical vapor deposition thin films as biopassivation coatings and directly patternable dielectrics
nork: Pryce Lewis, Hilton G. (Hilton Gavin), 1973-
Argitaratua: (2005)

Chemical vapor deposition of conjugated polymeric thin films for photonic and electronic applications
nork: Lock, John P
Argitaratua: (2006)

Environmentally focused patterning and processing of polymer thin films by initiated chemical vapor deposition (iCVD) and oxidative chemical vapor deposition (oCVD)
nork: Trujillo, Nathan J. (Nathan Jeffrey)
Argitaratua: (2011)

Low temperature physical-chemical vapor deposition of Ti-Si-N-O barrier films
nork: Lu, T. M., et al.
Argitaratua: (2012)

Investigation of SiC and C nanostructures synthesized by the method of chemical vapor deposition on Ni films
nork: A.K. Kenzhegulov, et al.
Argitaratua: (2018-06-01)

Elastic properties of 2D ultrathin tungsten nitride crystals grown by chemical vapor deposition
nork: Wang, Hong, et al.
Argitaratua: (2020)

Large-Size and Ultrahigh Purity Tungsten with Enhanced Physical Properties via Chemical Vapor Deposition
nork: Lipei Peng, et al.
Argitaratua: (2024-10-01)

ADSORPTION, ETCHING AND PHOTOINDUCED REACTIONS AT THE SI(100)-CCL4 INTERFACE
nork: French, C, et al.
Argitaratua: (1989)

Low temperature deposition of hydrogenated nanocrystalline SiC films by helicon wave plasma enhanced chemical vapor deposition/
nork: 496878 Yu, Wei, et al.

Chemically vapor deposited Si nanowires nucleated by self-assembled Ti islands on patterned and unpatterned Si substrates
nork: Kamins, T, et al.
Argitaratua: (2002)

Deposition of Nano Tungsten Oxide on Glass Mat Using Hot Filament Chemical Vapor Deposition for High Catalytic Activity
nork: Shahidi Sheila, et al.
Argitaratua: (2016-05-01)

Low energy Si+, SiCH5+, or C+ beam injections to silicon substrates during chemical vapor deposition with dimethylsilane
nork: Satoru Yoshimura, et al.
Argitaratua: (2023-08-01)

Electrochromism in tungsten oxide thin films prepared by chemical bath deposition
nork: Julijana Velevska, et al.
Argitaratua: (2017-03-01)