Studies of the chemistry of plasmas used for semiconductor etching

Studies of the chemistry of plasmas used for semiconductor etching

<p>Optical diagnostic techniques have been developed and then used to investigate the chemistry of reactive species formed in CF<sub>4</sub> / O<sub>2</sub> rf parallel plate discharges, similar to those employed in semiconductor material processing.</p> <p>...

पूर्ण विवरण

ग्रंथसूची विवरण
मुख्य लेखकों:	Toogood, M, M. J. Toogood
अन्य लेखक:	Hancock, G
स्वरूप:	थीसिस
भाषा:	English
प्रकाशित:	1991
विषय:	Semiconductors Etching Plasma etching

समान संसाधन

Plasma etching in semiconductor fabrication /
द्वारा: 217469 Morgan, Russ A.
प्रकाशित: (1985)

Plasma processes for semiconductor fabrication /
द्वारा: 414824 Hitchon, W. Nicholas G.
प्रकाशित: (1999)

Studies on etching and polymer deposition in halocarbon plasmas
द्वारा: Astell-Burt, P, और अन्य
प्रकाशित: (1987)

Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions /
द्वारा: Rossnagel, Stephen M., और अन्य
प्रकाशित: (1990)

Plasma technology in wool /
द्वारा: Kan, C. W., और अन्य
प्रकाशित: (2007)

Dry etching for VLSI /
द्वारा: 198063 Roosmalen, A. J. Van, और अन्य
प्रकाशित: (1991)

Etching performance of silicon wafers with redesigned etching drum : An Approach to Etching Optimization /
द्वारा: Rozzeta Dolah, author, और अन्य
प्रकाशित: (2012)

Etching performance of silicon wafers with redesigned etching drum /
द्वारा: 186505 Rozzeta Dolah, और अन्य
प्रकाशित: (2006)

Factor Design for the Oxide Etching Process to Reduce Edge Particle Contamination in Capacitively Coupled Plasma Etching Equipment
द्वारा: Ching-Ming Ku, और अन्य
प्रकाशित: (2022-06-01)

End point prediction in wet etching, cleaning, and rinsing of microstructures in semiconductor manufacturing
द्वारा: Calliandra Stuffle, और अन्य
प्रकाशित: (2022-08-01)

The versatile technique of RF plasma etching : the etch profile /
द्वारा: 427692 Jacob, Adir

RF reactor with asymmetrical electrodes for reactive ion etching of semiconductors
द्वारा: Dudin S. V., और अन्य
प्रकाशित: (2011-04-01)

Etching performance of silicon wafers with redesigned etching drum [electronic resource] /
द्वारा: 186505 Rozzeta Dolah, और अन्य
प्रकाशित: (2006)

Formation of Black Silicon in a Process of Plasma Etching with Passivation in a SF<sub>6</sub>/O<sub>2</sub> Gas Mixture
द्वारा: Andrey Miakonkikh, और अन्य
प्रकाशित: (2024-05-01)

Applications of plasma processes to VLSI technology/
द्वारा: Sugano, Takuo
प्रकाशित: (1985)

Formation Mechanism of Rounded SiGe-Etch Front in Isotropic SiGe Plasma Etching for Gate-All-Around FETs
द्वारा: Yu Zhao, और अन्य
प्रकाशित: (2021-01-01)

The versatile technique of Rf plasma etching : mechanistic considerations for selective etching /
द्वारा: 427692 Jacob, Adir

Digital Etching of Molybdenum Interconnects Using Plasma Oxidation
द्वारा: Ivan Erofeev, और अन्य
प्रकाशित: (2025-01-01)

Etching /
द्वारा: 375081 Edmondson, Leonard
प्रकाशित: (1973)

Doped or Quantum-Dot Layers as In Situ Etch-Stop Indicators for III/V Semiconductor Reactive Ion Etching (RIE) Using Reflectance Anisotropy Spectroscopy (RAS)
द्वारा: Guilherme Sombrio, और अन्य
प्रकाशित: (2021-04-01)

Effect of Plasma Etching Depth on Subsurface Defects in Quartz Crystal Elements
द्वारा: Qingzhi Li, और अन्य
प्रकाशित: (2023-10-01)

Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma
द्वारा: Inho Seong, और अन्य
प्रकाशित: (2022-11-01)

Plasma etching for fabrication of complex nanophotonic lasers from bonded InP semiconductor layers
द्वारा: Jakub Dranczewski, और अन्य
प्रकाशित: (2023-06-01)

Microstructural characterization and inductively coupled plasma-reactive ion etching resistance of Y2O3–Y4Al2O9 composite under CF4/Ar/O2 mixed gas conditions
द्वारा: Ho Jin Ma, और अन्य
प्रकाशित: (2024-03-01)

STUDY ABOUT ALUMINIUM ETCHING
द्वारा: Botis Mihaela
प्रकाशित: (2019-03-01)

RESEARCH PROCESS PLASMA ETCHING SIO2 MEMBRANE
द्वारा: T. A. Ismailov, और अन्य
प्रकाशित: (2016-07-01)

The versatile technique of RF plasma etching : kinetics of etchant formation /
द्वारा: 427692 Jacob, Adir

The Method of Low-Temperature ICP Etching of InP/InGaAsP Heterostructures in Cl<sub>2</sub>-Based Plasma for Integrated Optics Applications
द्वारा: Sergey Ishutkin, और अन्य
प्रकाशित: (2021-12-01)

Plasma etching and surface characteristics depending on the crystallinity of the BaTiO3 thin film
द्वारा: Han Byeol Lee, और अन्य
प्रकाशित: (2023-01-01)

Investigation into SiO<sub>2</sub> Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled
द्वारा: Won-nyoung Jeong, और अन्य
प्रकाशित: (2022-12-01)

Surface temper etch inspection after grinding
द्वारा: 11585 American National Standards Institute, और अन्य

Study of Atmospheric Pressure Plasma Temperature Based on Silicon Carbide Etching
द्वारा: Shaozhen Xu, और अन्य
प्रकाशित: (2023-05-01)

Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication
द्वारा: Michael Huff
प्रकाशित: (2021-08-01)

Manipulation of the Superhydrophobicity of Plasma-Etched Polymer Nanostructures
द्वारा: Ke Du, और अन्य
प्रकाशित: (2018-06-01)

Novel transparent high-entropy sesquioxide ceramics with high physicochemical plasma etching resistance
द्वारा: Yu-Bin Shin, और अन्य
प्रकाशित: (2025-01-01)

Variation of Bulk Etch Rate and some other Etching Parameters with Etching Temperature for Cellulose Nitrate LR-115 Detector
द्वारा: Ali Hussain
प्रकाशित: (2009-09-01)

A review of the mechanism and optimization of metal-assisted chemical etching and applications in semiconductors
द्वारा: Kibum Jung, और अन्य
प्रकाशित: (2024-12-01)

Redeposition-free inductively-coupled plasma etching of lithium niobate for integrated photonics
द्वारा: Kaufmann Fabian, और अन्य
प्रकाशित: (2023-01-01)

EVALUATION OF THE ADHESIVE INTERFACE BETWEEN ENAMEL AND A SINGLE-COMPONENT ADHESIVE APPLIED IN SELF-ETCHING AND SELECTIVE-ETCHING PROCEDURES
द्वारा: Gianina Iovan, और अन्य
प्रकाशित: (2014-07-01)

Selective Plasma Etching of Polymeric Substrates for Advanced Applications
द्वारा: Harinarayanan Puliyalil, और अन्य
प्रकाशित: (2016-06-01)