Studies of the chemistry of plasmas used for semiconductor etching
<p>Optical diagnostic techniques have been developed and then used to investigate the chemistry of reactive species formed in CF<sub>4</sub> / O<sub>2</sub> rf parallel plate discharges, similar to those employed in semiconductor material processing.</p> <p>...
| প্রধান লেখক: | , |
|---|---|
| অন্যান্য লেখক: | |
| বিন্যাস: | গবেষণাপত্র |
| ভাষা: | English |
| প্রকাশিত: |
1991
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| বিষয়গুলি: |