Studies of the chemistry of plasmas used for semiconductor etching
<p>Optical diagnostic techniques have been developed and then used to investigate the chemistry of reactive species formed in CF<sub>4</sub> / O<sub>2</sub> rf parallel plate discharges, similar to those employed in semiconductor material processing.</p> <p>...
| المؤلفون الرئيسيون: | , |
|---|---|
| مؤلفون آخرون: | |
| التنسيق: | أطروحة |
| اللغة: | English |
| منشور في: |
1991
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| الموضوعات: |