A theory of pad conditioning for chemical-mechanical polishing

Statistical models are presented to describe the evolution of the surface roughness of polishing pads during the pad-conditioning process in chemical-mechanical polishing. The models describe the evolution of the surface-height probability-density function of solid pads during fixed height or fixed...

詳細記述

書誌詳細
主要な著者: Borucki, L, Witelski, T, Please, C, Kramer, P, Schwendeman, D
フォーマット: Journal article
言語:English
出版事項: 2004