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ADSORPTION, ETCHING AND PHOTOI...
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Stalna poveznica
ADSORPTION, ETCHING AND PHOTOINDUCED REACTIONS AT THE SI(100)-CCL4 INTERFACE
Pokaži ostale verzije (1)
Bibliografski detalji
Glavni autori:
French, C
,
Jackman, R
,
Price, R
,
Foord, J
Format:
Journal article
Izdano:
1989
Primjerci
Opis
Ostale verzije (1)
Slični predmeti
Prikaz za djelatnike knjižnice
Opis
Sažetak:
Slični predmeti
Adsorption, etching and photo-induced reactions at the Si(100)-CCl 4 interface
od: French, C, i dr.
Izdano: (1989)
REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)
od: Jackman, R, i dr.
Izdano: (1986)
CHEMICAL PRECURSORS FOR GAAS ETCHING WITH LOW-ENERGY ION-BEAMS - CHLORINE ADSORPTION ON GAAS(100)
od: Jackman, R, i dr.
Izdano: (1991)
Surface studies of the interaction of Cl2 with InP(100)(4 × 2); an investigation of adsorption, thermal etching and ion beam assisted processes
od: Murrell, A, i dr.
Izdano: (1990)
SURFACE STUDIES OF THE INTERACTION OF CL-2 WITH INP(100)(4X2) - AN INVESTIGATION OF ADSORPTION, THERMAL ETCHING AND ION-BEAM ASSISTED PROCESSES
od: Murrell, A, i dr.
Izdano: (1990)