ADSORPTION, ETCHING AND PHOTOINDUCED REACTIONS AT THE SI(100)-CCL4 INTERFACE

Ítems similars

• Adsorption, etching and photo-induced reactions at the Si(100)-CCl 4 interface
  per: French, C, et al.
  Publicat: (1989)
• REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)
  per: Jackman, R, et al.
  Publicat: (1986)
• CHEMICAL PRECURSORS FOR GAAS ETCHING WITH LOW-ENERGY ION-BEAMS - CHLORINE ADSORPTION ON GAAS(100)
  per: Jackman, R, et al.
  Publicat: (1991)
• Surface studies of the interaction of Cl2 with InP(100)(4 × 2); an investigation of adsorption, thermal etching and ion beam assisted processes
  per: Murrell, A, et al.
  Publicat: (1990)
• SURFACE STUDIES OF THE INTERACTION OF CL-2 WITH INP(100)(4X2) - AN INVESTIGATION OF ADSORPTION, THERMAL ETCHING AND ION-BEAM ASSISTED PROCESSES
  per: Murrell, A, et al.
  Publicat: (1990)