EFFECTS OF HIGH UNIAXIAL STRESS ON FAR INFRA-RED IMPURITY SPECTRA OF HIGH-PURITY NORMAL-TYPE AND PARA-TYPE SILICON

EFFECTS OF HIGH UNIAXIAL STRESS ON FAR INFRA-RED IMPURITY SPECTRA OF HIGH-PURITY NORMAL-TYPE AND PARA-TYPE SILICON

Bibliografske podrobnosti
Main Authors: Cooke, R, Nicholas, R, Stradling, R, Portal, J, Askenazy, S
Format: Journal article
Izdano: 1978

Podobne knjige/članki