Investigating the Trimethylaluminium/Water ALD Process on Mesoporous Silica by In Situ Gravimetric Monitoring

Investigating the Trimethylaluminium/Water ALD Process on Mesoporous Silica by In Situ Gravimetric Monitoring

A low amount of AlOx was successfully deposited on an unordered, mesoporous SiO2 powder using 1–3 ALD (Atomic Layer Deposition) cycles of trimethylaluminium and water. The process was realized in a self-built ALD setup featuring a microbalanceand a fixed particle bed. The reactor temperatu...

Fuld beskrivelse

Bibliografiske detaljer
Main Authors: Verena E. Strempel, Kristian Knemeyer, Raoul Naumann d’Alnoncourt, Matthias Driess, Frank Rosowski
Format: Article
Sprog:English
Udgivet: MDPI AG 2018-05-01
Serier:Nanomaterials
Fag:
atomic layer deposition
ALD
in situ gravimetric
mesoporous silica
ligand exchange
fixed bed
particle coating
Online adgang:http://www.mdpi.com/2079-4991/8/6/365

Internet

http://www.mdpi.com/2079-4991/8/6/365

Lignende værker