The Study of Reactive Ion Etching of Heavily Doped Polysilicon Based on HBr/O<sub>2</sub>/He Plasmas for Thermopile Devices
Heavily doped polysilicon layers have been widely used in the fabrication of microelectromechanical systems (MEMS). However, the investigation of high selectivity, anisotropy, and excellent uniformity of heavily doped polysilicon etching is limited. In this work, reactive ion etching of undoped and...
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Bibliographic Details
Main Authors: |
Na Zhou,
Junjie Li,
Haiyang Mao,
Hao Liu,
Jinbiao Liu,
Jianfeng Gao,
Jinjuan Xiang,
Yanpeng Hu,
Meng Shi,
Jiaxin Ju,
Yuxiao Lei,
Tao Yang,
Junfeng Li,
Wenwu Wang |
Format: | Article
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Language: | English |
Published: |
MDPI AG
2020-09-01
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Series: | Materials
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Subjects: | |
Online Access: | https://www.mdpi.com/1996-1944/13/19/4278
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