Fabrication and characterization of MR thin films using IBS system
Recently magnetoresistive films have received great attention because of their applications in magnetic recording. One of the most used materials is Permalloy(NiFe) film, since this material has the low coercivity, anisotropy field and magnetostriction. It is thought as the most preferred single lay...
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Format: | Thesis |
Language: | English |
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2009
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Online Access: | http://hdl.handle.net/10356/19561 |
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author | Qian, Yin |
author2 | Tay, Beng Kang |
author_facet | Tay, Beng Kang Qian, Yin |
author_sort | Qian, Yin |
collection | NTU |
description | Recently magnetoresistive films have received great attention because of their applications in magnetic recording. One of the most used materials is Permalloy(NiFe) film, since this material has the low coercivity, anisotropy field and magnetostriction. It is thought as the most preferred single layer material in this area. The ion beam sputtering system is thought as the ideal equipment for the investigation of the influence of deposition parameters on the thin film because it can independently control various parameters that may influence the film growth. These parameters include sputtering ion energy and density and bombardment ion energy and density. |
first_indexed | 2024-10-01T05:35:01Z |
format | Thesis |
id | ntu-10356/19561 |
institution | Nanyang Technological University |
language | English |
last_indexed | 2024-10-01T05:35:01Z |
publishDate | 2009 |
record_format | dspace |
spelling | ntu-10356/195612023-07-04T15:25:51Z Fabrication and characterization of MR thin films using IBS system Qian, Yin Tay, Beng Kang School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials Recently magnetoresistive films have received great attention because of their applications in magnetic recording. One of the most used materials is Permalloy(NiFe) film, since this material has the low coercivity, anisotropy field and magnetostriction. It is thought as the most preferred single layer material in this area. The ion beam sputtering system is thought as the ideal equipment for the investigation of the influence of deposition parameters on the thin film because it can independently control various parameters that may influence the film growth. These parameters include sputtering ion energy and density and bombardment ion energy and density. Master of Engineering 2009-12-14T06:15:20Z 2009-12-14T06:15:20Z 1997 1997 Thesis http://hdl.handle.net/10356/19561 en NANYANG TECHNOLOGICAL UNIVERSITY 135 p. application/pdf |
spellingShingle | DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials Qian, Yin Fabrication and characterization of MR thin films using IBS system |
title | Fabrication and characterization of MR thin films using IBS system |
title_full | Fabrication and characterization of MR thin films using IBS system |
title_fullStr | Fabrication and characterization of MR thin films using IBS system |
title_full_unstemmed | Fabrication and characterization of MR thin films using IBS system |
title_short | Fabrication and characterization of MR thin films using IBS system |
title_sort | fabrication and characterization of mr thin films using ibs system |
topic | DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials |
url | http://hdl.handle.net/10356/19561 |
work_keys_str_mv | AT qianyin fabricationandcharacterizationofmrthinfilmsusingibssystem |