Fabrication and characterization of MR thin films using IBS system

Recently magnetoresistive films have received great attention because of their applications in magnetic recording. One of the most used materials is Permalloy(NiFe) film, since this material has the low coercivity, anisotropy field and magnetostriction. It is thought as the most preferred single lay...

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Bibliographic Details
Main Author: Qian, Yin
Other Authors: Tay, Beng Kang
Format: Thesis
Language:English
Published: 2009
Subjects:
Online Access:http://hdl.handle.net/10356/19561
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author Qian, Yin
author2 Tay, Beng Kang
author_facet Tay, Beng Kang
Qian, Yin
author_sort Qian, Yin
collection NTU
description Recently magnetoresistive films have received great attention because of their applications in magnetic recording. One of the most used materials is Permalloy(NiFe) film, since this material has the low coercivity, anisotropy field and magnetostriction. It is thought as the most preferred single layer material in this area. The ion beam sputtering system is thought as the ideal equipment for the investigation of the influence of deposition parameters on the thin film because it can independently control various parameters that may influence the film growth. These parameters include sputtering ion energy and density and bombardment ion energy and density.
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spelling ntu-10356/195612023-07-04T15:25:51Z Fabrication and characterization of MR thin films using IBS system Qian, Yin Tay, Beng Kang School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials Recently magnetoresistive films have received great attention because of their applications in magnetic recording. One of the most used materials is Permalloy(NiFe) film, since this material has the low coercivity, anisotropy field and magnetostriction. It is thought as the most preferred single layer material in this area. The ion beam sputtering system is thought as the ideal equipment for the investigation of the influence of deposition parameters on the thin film because it can independently control various parameters that may influence the film growth. These parameters include sputtering ion energy and density and bombardment ion energy and density. Master of Engineering 2009-12-14T06:15:20Z 2009-12-14T06:15:20Z 1997 1997 Thesis http://hdl.handle.net/10356/19561 en NANYANG TECHNOLOGICAL UNIVERSITY 135 p. application/pdf
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
Qian, Yin
Fabrication and characterization of MR thin films using IBS system
title Fabrication and characterization of MR thin films using IBS system
title_full Fabrication and characterization of MR thin films using IBS system
title_fullStr Fabrication and characterization of MR thin films using IBS system
title_full_unstemmed Fabrication and characterization of MR thin films using IBS system
title_short Fabrication and characterization of MR thin films using IBS system
title_sort fabrication and characterization of mr thin films using ibs system
topic DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
url http://hdl.handle.net/10356/19561
work_keys_str_mv AT qianyin fabricationandcharacterizationofmrthinfilmsusingibssystem