Resolution limits and process latitude of comformable contact nano-lithography

Resolution limits and process latitude of comformable contact nano-lithography

Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2007.

Detaylı Bibliyografya
Yazar:	Fucetola, Corey Patrick
Diğer Yazarlar:	David J. Carter and Henry I. Smith.
Materyal Türü:	Tez
Dil:	eng
Baskı/Yayın Bilgisi:	Massachusetts Institute of Technology 2008
Konular:	Electrical Engineering and Computer Science.
Online Erişim:	http://hdl.handle.net/1721.1/41640

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